A lower entree cost of ownership with a versatile cryogenic micro-manipulated probe station used for non-destructive testing of devices on full and partial wafers up to 100 mm (4 in) in diameter.
The probe station is a platform for measurement of electrical, electro-optical, parametric, high Z, DC, RF, and microwave properties of materials and test devices. Nanoscale electronics, quantum wires and dots, and semiconductors are typical materials measured in a TTPX. A wide selection of probes, cables, sample holders, and options makes it possible to configure the TTPX to meet your specific measurement applications
The probe station provides efficient temperature operation and control with a continuous refrigeration system using either liquid helium or liquid nitrogen. Vapor-cooled shielding optimizes efficiency and intercepts blackbody radiation before it reaches the sample. A control heater allows precise sample stage temperature control, and along with the radiation shield heater, provides the probe station with fast thermal response.
Feature
- High stability operation from 4.2 K to 475 K
- Optional temperature range from 3.2 K to 475 K or 20 K to 675 K
- Ø5 mm (0.2 in) optical access through the sample stage for backside illumination of the sample
- Measurements from DC to 67 GHz
- Accommodates up to 51 mm (2 in) diameter wafers
- Configurable with up to six thermally anchored micro-manipulated probe arms
- Probe arms with 3-axis adjustments and ±5° theta planarization
- Cables, shields, and guards minimize electrical noise and thermal radiation losses
- Tabletop design with small footprint
- Options and accessories for customization to specific research needs
Intrinsic Electrical Properties of Individual SWCT with Small Band Gaps,
PRL, Stanford Univ
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