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Thermal ALD System. by Veeco

Thermal ALD is a binary process involving two reactants, A and B. The ALD chamber is filled with the initial reactant, A. After processing the wafer, the chemicals are purged. The second reactant, B, then goes through the identical procedure.

Veeco is the leading provider of atomic layer deposition (ALD) systems for research and industry worldwide, delivering comprehensive services and versatile, turnkey systems that are accessible, affordable and accurate to the atomic scale. Thin film deposition is our expertise. Our Savannah® Series of thin film deposition tools exemplifies these competencies.

Key Features:

  • In-Situ Ellipsometry
  • In-Situ QCM
  • Self Assembling Monolayers
  • 2-Second Cycle Times
  • Integrated Ozone
  • Low Vapor Pressure Deposition
  • Batch Processing
  • Glove Box Integration

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