Sputter coating is the standard method for deposition a thin film layer of oxidize such as Al, Chromium or a non-oxidizing such as gold, platinum on sample.
The blanket process will give a uniform deposition rate over a variety of sample size. The equipment allows carbon evaporation process when selected item are purchase and assemble in the main system. For further thin-film applications, Sputter Coater allows consecutive metal layers to be deposited, without the need to break the vacuum. The item widely used in semiconductor process and Electron Microscopy sample preparation.
