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Mask Aligner. by MIDAS, Korea

MDA-400M-6

mda-400s-border-400x250

  • Type: PC/PLC Control Manual (Mask Aligner)
  • Mask Size: Up to 7″ x 7″
  • Substrate Size: piece to 6″
Click to View More Spec
  • UV Lamp & Power: 350W & Power Supply
  • Uniform Beam Size: 6.25″ x 6.25″
  • Beam Uniformity: <±5% 
  • Beam Wavelength: 350~450nm
  • 365nm intensity:~25mW/cm2 
  • Alignment Accuracy: 1um
  • Process resolution: 1um@1um PR thickness with vacuum contact 
  • Process mode: Soft, Hard, Vacuum contact & Proximity
  • Substrate chuck movement: x,y,z & ?
  • Other Accessories: Anti vibration table, IR BSA
  • Option available: UV Intensity meter, UV-LED (365nm) exposure module

MDA-60MS

MDA-60MSborder-300x300

  • Type: Manual (PC Control)
  • Mask Size: Up to 7″ x 7″
  • Substrate Size: piece to 6″x6″
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  • UV Lamp & Power: 1kW & Power Supply
  • Uniform Beam Size: 7.25″ x 7.25″
  • Beam Uniformity: <±5%
  • Beam Wavelength: 350~450nm
  • 365nm intensity:~25mW/cm2
  • Alignment Accuracy: 1um
  • Process resolution: 1um@1um PR thickness with vacuum contact
  • Process mode: Soft, Hard, Vacuum contact & Proximity
  • Substrate chuck movement: x,y(Manual), z, ? (Motorized)
  • Option available: CCD BSA, UV Intensity meter, Anti Vibration Table

MDA-400M
MDA-400M-re-247x300

  • Type: Fully Manual (Mask Aligner)
  • Mask Size: Up to 5″ x 5″
  • Substrate Size: piece to 4″ dia
Click to View More Spec
  • UV Lamp & Power: 350W & Power Supply
  • Uniform Beam Size: 4.25″ x 4.25″
  • Beam Uniformity: <±3%
  • Beam Wavelength: 350~450nm
  • 365nm intensity: 20~30mW/cm2
  • Alignment Accuracy: 1um
  • Process resolution: 1um@1um PR thickness with vacuum contact
  • Process mode: Soft, Hard, Vacuum contact & Proximity
  • Substrate chuck movement: x,y,z & ?
  • Option available: Anti vibration table, UV Intensity meter,

MDA-400LJ

MDA-400LJ-300x290

  • Type: Fully Manual (Mask Aligner)
  • Mask Size: Up to 5″ x 5″
  • Substrate Size: piece to 4″ dia
Click to View More Spec
  • UV Lamp & Power: UV LED & Power Supply
  • Uniform Beam Size: 125mm dia”
  • Beam Uniformity: <±3%
  • Beam Wavelength: 365nm
  • 365nm intensity:~20mW/cm2
  • Alignment Accuracy: 1um
  • Process resolution: 1um@1um PR thickness with vacuum contact
  • Process mode: Soft, Hard, Vacuum contact & Proximity
  • Substrate chuck movement: x,y,z & ?

 

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