Please contact our office for immediate response. Contact Us
Open
X

RIE. Reactive Ion Etching System

Reactive ion etching is an etching technology used in micro fabrication in semiconductor and etc. It uses chemically reactive plasma to remove material deposited on wafers or glasses.

The plasma is generated under low pressure which is in vacuum state by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it

RIE

 

Interested to this product? Contact Us Now

* indicates required field
Best gambling websites website